Okoroanyanwu U. Molecular Theory of Lithography

Society of Photo-Optical Instrumentation Engineers (SPIE), Press, USA, 2016. – 491 p. – ISBN: 1628415517This book is a unified exposition of the molecular theory that underlies lithographic imaging. It explains with physical-chemical theories the molecular-level interactions involved in lithographic imaging. It also provides the theoretical basis for the main unit operations of the advanced lithographic process, as well as for advanced lithographic imaging mechanisms, including photochemical and radiochemical, imprint, and directed block copolymer self-assembly imaging mechanisms. The book is intended for student and professionals whose knowledge of lithography extends to the chemistry and physics underlying its various forms. A familiarity with chemical kinetics, thermodynamics, statistical mechanics, and quantum mechanics will be helpful, as will be familiarity with elementary concepts in physics such as energy, force, electrostatics, electrodynamics, and optics.Overview of Lithography
Theory of the Lithographic Process
Theory of Molecular Interactions in Lithography
Theory of Photochemical and Radiochemical Lithographic Imaging Mechanisms
Theory of Block Copolymer Self-assembly Lithographic Imaging Mechanisms
Theory of Imprint Lithographic Imaging Mechanisms