Murarka S.P., Eizenberg M., Sinha A.K. (Eds.) Interlayer Dielectrics for Semiconductor Technologies

Amsterdam: Elsevier/Academic Press, 2003. — xiv, 444 p. — ISBN: 978-0-12-511221-5.Acknowledgements.
List of Contributors.
Introduction: Interlayer dielectrics in microelectronic devices
M. Eizenberg.
Dielectric properties.
S.P. Murarka.
Characterization of low dielectric constant materials.
P.S. Ho, J. Liu, M. Morgen, M. Kiene, J.-H. Zhao and C. Hu.
Compatibilities of dielectric films.
C.K. Goldberg and V.S. Wang.
Silicon-based dielectrics.
C. Leung and E. Ong.
Low-k polymers.
S.P. Murarka.
Chemical vapor deposition of C-F low-k materials.
M. Uhlig and T. Gessner.
Spin-on Si-based low-k materials.
S.E. Schulz and T. Gessner.
Nanoporous dielectric films: Fundamental property relations and microelectronics applications.
J.L. Plawsky, W.N. Gill, A. Jain and S. Rogojevic.
High-k dielectrics grown by atomic layer deposition: Capacitor and gate applications.
M.D. Groner and S.M. George.
Dielectric materials in optical waveguide applications.
P.D. Persans, F. Huang, N. Agarwal, S. Ponoth and J.L. Plawsky.
Reliability.
S.P. Murarka.
Future trends in silicon technologies.
E. Ong and A. Sinha.